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International Affairs Students Current Students Alumni Faculty/Staff Careers--> TOHOKU UNIVERSITYCREATING GLOBAL EXCELLENCE Search 日本語 Contact Tohoku University --> About Facts & Figures Facilities Organization Chart History President's Message Top Global University Project Designated National University Global Network Promotional Videos Academics Undergraduate Graduate Courses in English Exchange Programs Summer Programs Double Degree Programs Academic Calendar Syllabus Admissions Undergraduate Admissions Graduate Admissions Fees and Expenses Financial Aid Research Feature Highlights Research Releases University Research News Research Institutes Visitor Research Center Research Profiles Academic Research Staff Campus Life International Support Office IT Services Facilities Dining & Shops Campus Bus Clubs & Circles News University News Research--> Arts & Culture Health & Sports Campus & Community Press Release--> International Visit Alumni Careers Events Exhibits Music Special Event Lecture Alumni--> Map & Directions Campus Maps & Bus--> Facilities Map--> TOHOKUUNIVERSITY About Academics Admissions Research Campus Life News Events International Affairs Students Current Students Alumni Faculty/Staff Promotional Videos Subscribe to our Newsletter Map & Directions Contact Jobs & Vacancies Emergency Information Site Map 日本語 Close Home Research News Electrochemical etching down to one-monolayer towards high-Tc superconductivity Research News Electrochemical etching down to one-monolayer towards high-Tc superconductivity 2015-11-04 A new route for exploration of nontrivial physical phenomena at two-dimensional materials Iron selenide (FeSe) is an attracting superconducting material since the superconducting transition temperature (Tc) is enhanced from 8 K in bulk form toward 65 K in one-monolayer form. However, systematic thickness dependence of electrical measurement has been difficult to address. A team of researchers at Tohoku University's Institute for Materials Research (IMR), has realized layer-by-layer etching in superconducting FeSe films down to approximately one-monolayer about 0.6 nm using classical electrochemical reaction in electric-double-layer transistor configuration. As the thickness of the films becomes thin, the superconducting transition temperature (Tc) is increased from bulk value (8 K) to about 40 K. In addition, the research group unveils that by combining with an electrostatic charging effect, the high-Tc transition can be induced in 10-nm thick condition (20 monolayers), which had been limited in one/two-monolayers so far. The development of this etching technique will pave the way for the exploration of nontrivial physical phenomena in atomically thin two-dimensional films. This had previously been difficult to address by conventional methods. This work was published in Nature Physics online on Nov 2, 2015. Figure: Schematic of electric-double-layer transistor device and electrochemical reaction on FeSe surface. (Left) Device structure of electric-double-layer transistor with FeSe channel deposited on oxide substrate. (Right) One-monolayer FeSe is realized by electrochemical etching where Fe and Se ions are dissolved into ionic liquid. Publication Information Authors: J. Shiogai, Y. Ito, T. Mitsuhashi, T. Nojima and A. Tsukazaki Title: Electric-field-induced superconductivity in electrochemically etched ultrathin FeSe films on SrTiO3 and MgO Journal: Nature Physics DOI: 10.1038/nphys3530 Contact: Junichi ShiogaiInstitute of Materials Research, Tohoku University Email: junichi.shiogaiimr.tohoku.ac.jp Atsushi TsukazakiInstitute of Materials Research, Tohoku UniversityEmail: tsukazakiimr.tohoku.ac.jp Archives 2014&＃24180; 2015&＃24180; 2016&＃24180; 2017&＃24180; 2018&＃24180; 2019&＃24180; 2020&＃24180; 2021&＃24180; 2022&＃24180; 2023&＃24180; Page Top About Tohoku University Academics Admissions Research Campus Life News Events International Affairs Students Alumni Promotional Videos Subscribe to our Newsletter Map & Directions Contact Tohoku University Jobs & Vacancies Emergency Information Site Map Media Enquiries Parent & Family Support Public Facilities Contact Tohoku University